Faculty Publications - Costas J. Spanos

Books

• G. S. May and C. J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control, Wiley-Interscience, Hoboken, NJ: John Wiley & Sons, Inc./IEEE Press, 2006.
• G. S. May and C. J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control, Wiley-Interscience, Hoboken, NJ: John Wiley & Sons, Inc., 2006.

Book chapters or sections

• D. Zeng, Y. Tan, and C. J. Spanos, "Dimensionality reduction methods in virtual metrology," in Metrology, Inspection, and Process Control for Microlithography XXII, J. A. Allgair and C. J. Raymond, Eds., Proceedings of SPIE, Vol. 6922, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 38-1-11.
• J. Xue, C. J. Spanos, and A. R. Neureuther, "Probe-pattern grating focus monitor through scatterometry calibration," in Metrology, Inspection, and Process Control for Microlithography XXII, J. A. Allgair and C. J. Raymond, Eds., Proceedings of SPIE, Vol. 6922, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 25-1-12.
• K. Patel, T. King Liu, and C. J. Spanos, "Impact of gate line edge roughness on double-gate FinFET performance variability," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1I-1-10.
• K. Qian and C. J. Spanos, "A comprehensive model of process variability for statistical timing optimization," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1G-1-11.
• Y. Ben, J. Xue, and C. J. Spanos, "Using composite gratings for optical system characterization through scatterometry," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1B-1-12.
• Q. Y. Tang and C. J. Spanos, "Layout optimization based on a generalized process variability model," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 0F-1-12.
• N. Ma, J. Ghan, S. Mishra, C. J. Spanos, K. Poolla, N. Rodriguez, and L. Capodieci, "Automatic hotspot classification using pattern-based clustering," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 05-1-10.
• J. Xue, Y. Ben, C. Wang, M. Miller, C. J. Spanos, and A. R. Neureuther, "Parameter sensitive patterns for scatterometry monitoring," in Photomask Technology 2007, R. J. Naber and H. Kawahira, Eds., Proceedings of SPIE, Vol. 6730, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2007, pp. 4S-1-10.
• J. Xue, K. Moen, and C. J. Spanos, "Integrated aerial image sensor: Modeling and assembly," in Metrology, Inspection, and Process Control for Microlithography XX, C. N. Archie, Ed., Proceedings of SPIE, Vol. 6152, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2006, pp. 211-1-8.
• P. Friedberg, W. Cheung, and C. J. Spanos, "Spatial modeling of micon-scale gate length variation," in Data Analysis and Modeling for Process Control III, I. Emami and K. W. Tobin, Jr., Eds., Proceedings of SPIE, Vol. 6155, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2006, pp. 0C-1-12.
• Q. Zhang, K. Poolla, and C. J. Spanos, "Modeling of mask thermal distortion and its dependency on pattern density," in Photomask and Next-Generation Lithography Mask Technology XII, M. Komuro, Ed., Proceedings of SPIE, Vol. 5853, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 234-242.
• P. Friedberg, Y. Cao, J. Cain, R. Wang, J. M. Rabaey, and C. J. Spanos, "Modeling within-field gate length spatial variation for process-design co-optimization," in Design and Process Integration for Microelectronic Manufacturing III, L. W. Liebermann, Ed., Proceedings of SPIE, Vol. 5756, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 178-188.
• J. P. Cain, P. Naulleau, and C. J. Spanos, "Modeling of EUV photoresists with a resist point spread function," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 1101-1109.
• J. P. Cain, P. Naulleau, and C. J. Spanos, "Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 1092-1100.
• J. P. Cain, P. Naulleau, and C. J. Spanos, "Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 741-748.
• J. P. Cain, P. Naulleau, and C. J. Spanos, "Lithographic measurement of EUV flare in the 0.3-NA Micro Exposure Tool optic at the Advanced Light Source," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 301-311.
• J. P. Cain, G. McIntyre, P. Naulleau, A. Pawloski, B. La Fontaine, O. Wood, C. J. Spanos, and A. R. Neureuther, "Two-wave pattern shift aberration monitor for centrally obscured optical systems," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 1230-1237.
• J. Xue and C. J. Spanos, "Design of an integrated aerial image sensor," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 392-403.
• Q. Zhang, C. Tang, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, and C. J. Spanos, "Comprehensive CS uniformity control across lithography and etch," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 692-701.
• Q. Zhang, P. D. Friedberg, C. Tang, B. Singh, K. Poolla, and C. J. Spanos, "Across-wafer CD uniformity enhancement through control of multizone PEB profiles," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 276-286.
• P. D. Friedberg, C. Tang, B. Singh, T. Brueckner, W. Gruendke, B. Schulz, and C. J. Spanos, "Time-based PEB adjustment for optimizing CD distributions," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 703-712.
• J. P. Cain and C. J. Spanos, "Electrical linewidth metrology for systematic CD variation characterization and causal analysis," in Metrology, Inspection, and Process Control for Microlithography XVII, D. J. `Herr, Ed., Proceedings of SPIE, Vol. 5038, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2003, pp. 350-361.
• H. Zhang, J. P. Cain, and C. J. Spanos, "Compact formulation of mask error factor for critical dimension control in optical lithography," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. C. Herr, Ed., Proceedings of SPIE, Vol. 4689, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2002, pp. 462-465.
• J. P. Cain, H. Zhang, and C. J. Spanos, "Optimum sampling for characterization of systematic variation in photolithography," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. C. Herr, Ed., Proceedings of SPIE, Vol. 4689, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2002, pp. 430-442.
• D. A. Steele, A. Coniglio, C. Tang, B. Singh, S. Nip, and C. J. Spanos, "Characterizing post exposure bake processing for transient and steady state conditions, in the context of critical dimension control," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. C. Herr, Ed., Proceedings of SPIE, Vol. 4689, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2002, pp. 517-530.
• N. Jakatdar, X. Niu, J. Bao, C. J. Spanos, S. Yedur, and A. Deleporte, "Phase profilometry for the 193 nm lithography gate stack," in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, Ed., Proceedings of SPIE, Vol. 3998, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2000, pp. 116-124.
• J. Bao, X. Niu, N. Jakatdar, C. J. Spanos, and J. J. Bendik, "Specular spectral profilometry on metal layers," in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, Ed., Proceedings of SPIE, Vol. 3998, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2000, pp. 882-892.
• X. Niu, N. Jakatdar, J. Bao, C. J. Spanos, and S. Yedur, "Specular spectroscopic scatterometry in DUV lithography," in Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Ed., Proceedings of SPIE, Vol. 3677, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 159-168.
• N. Jakatdar, J. Bao, C. J. Spanos, X. Niu, J. Bendik, and S. Hill, "A parameter extraction framework for DUV lithography simulation," in Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Ed., Proceedings of SPIE, Vol. 3677, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 447-456.
• N. Jakatdar, J. Bao, C. J. Spanos, R. Subramanian, and B. Rangarajan, "Physical modeling of deprotection induced thickness loss," in Advances in Resist Technology and Processing XVI, W. Conley, Ed., Proceedings of SPIE, Vol. 3678, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 275-282.
• X. Niu, N. Jakatdar, and C. J. Spanos, "Deep ultraviolet lithography simulator tuning by resist profile matching," in Lithorgraphy for Semiconductor Manufacturing, C. A. Mack and T. Stevenson, Eds., Proceedings EUROPTO Series, Vol. 3741, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 245-252.
• N. Jakatdar, J. Bao, C. J. Spanos, R. Subramanian, B. Rangarajan, and A. Romano, "Physically based model for predicting volume shrinkage in chemically amplified resists," in In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, K. Amberiadis, G. Kissinger, K. Okumura, S. Pabbisetty, and L. H. Weiland, Eds., Proceedings EUROPTO Series, Vol. 3743, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumenation Engineers, 1999, pp. 16-24.
• N. Jakatdar, X. Niu, J. Musacchio, and C. J. Spanos, "In-situ metrology for deep ultraviolet lithography process control," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 262-270.
• X. Niu, N. H. Jakatdar, C. J. Spanos, J. J. Bendik, and R. P. Kovacs, "Optical thin-film decomposition of DUV positive tone resist process monitoring," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 411-18.
• N. Jakatdar, X. Niu, and C. J. Spanos, "Characterization of a chemically amplified photoresist for simulation using a modified "poor man's DRM" methodology," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 578-585.
• N. Jakatdar, X. Niu, C. J. Spanos, A. Romano, J. Bendik, R. Kovacs, and S. Hill, "Characterization of a positive chemically amplified photoresist for process control," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society for Photo-Optical Instrumentation Engineers, 1998, pp. 586-593.
• X. Niu, N. Jakatdar, and C. J. Spanos, "Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data," in Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, J. C. Stover, Ed., Proceedings of SPIE, Vol. 3275, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 172-179.
• N. Jakatdar, X. Niu, and C. J. Spanos, "A neural network approach to rapid thin film characterization," in Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, J. C. Stover, Ed., Proceedings of SPIE, Vol. 3275, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 163-171.
• C. Yu, A. Minvielle, and C. J. Spanos, "SEM characterization of etch and develop contributions to poly CD error," in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, Ed., Proceedings of SPIE, Vol. 2725, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1996, pp. 169-172.
• R. L. Chen and C. J. Spanos, "Fuzzy inference system for semiconductor manufacturing processes," in Applications of Fuzzy Logic Technology II, B. Bosacchi and J. C. Bezdek, Eds., Proceedings of SPIE, Vol. 2493, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1995, pp. 273-286.
• C. J. Spanos, S. Leang, S. Ma, J. Thomson, B. J. Bombay, and X. Niu, "A multistep supervisory controller for photolithographic operations," in Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing I: Proc. 1st Intl. Symp., M. Meyyappan, D. J. Economou, and S. W. Butler, Eds., Pennington, NJ: Electrochemical Society, 1995, pp. 3-17.
• B. J. Bombay and C. J. Spanos, "Application of adaptive equipment models to a photolithographic process," in Process Module Metrology, Control and Clustering, C. J. Davis, I. P. Herman, and T. R. Turner, Eds., Proceedings of SPIE, Vol. 1594, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1992, pp. 277-284.
• Z. Ling, S. Leang, and C. J. Spanos, "In-line supervisory control in a photolithographic workcell," in Advanced Techniques for Integrated Circuit Processing, J. A. Bondur and T. R. Turner, Eds., Proceedings of SPIE, Vol. 1392, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1991, pp. 660-669.
• N. H. Chang and C. J. Spanos, "Chronological equipment diagnosis using evidence integration," in Applications of Artificial Intelligence VIII, M. M. Trivedi, Ed., Proceedings of SPIE, Vol. 1293, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1990, pp. 944-955.

Articles in journals or magazines

• Q. Zhang, K. Poolla, and C. J. Spanos, "Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment," IEEE Trans. Semiconductor Manufacturing, vol. 20, no. 4, pp. 488-505, Nov. 2007.
• J. Xue, K. Moen, and C. J. Spanos, "Integrated aerial image sensor: Design, modeling, and assembly," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 24, no. 6, pp. 3088-3093, Nov. 2006.
• J. P. Cain, P. P. Naulleau, E. M. Gullikson, and C. J. Spanos, "Lithographic characterization of the flare in the berkeley 0.3 numerical aperture extreme ultraviolet microfield optic," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 24, no. 3, pp. 1234-1237, May 2006.
• J. P. Cain, P. Naulleau, and C. J. Spanos, "Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 24, no. 1, pp. 326-330, Jan. 2006.
• R. Chang and C. J. Spanos, "Dishing-radius model of copper CMP dishing effects," IEEE Trans. Semiconductor Manufacturing, vol. 18, no. 2, pp. 297-303, May 2005.
• M. Freed, M. V. P. Kruger, C. J. Spanos, and K. Poolla, "Wafer-grown heat flux sensor arrays for plasma etch processes," IEEE Trans. Semiconductor Manufacturing, vol. 18, no. 1, pp. 148-162, Feb. 2005.
• R. Chang, Y. Cao, and C. J. Spanos, "Modeling the electrical effects of metal dishing due to CMP for on-chip interconnect optimization," IEEE Trans. Electron Devices, vol. 51, no. 10, pp. 1577-1583, Oct. 2004.
• J. Wang and C. J. Spanos, "Real-time furnace modeling and diagnostics," IEEE Trans. Semiconductor Manufacturing, vol. 15, no. 4, pp. 393-403, Nov. 2002.
• P. Jula, C. J. Spanos, and R. C. Leachman, "Comparing the economic impact of alternative metrology methods in semiconductor manufacturing," IEEE Trans. Semiconductor Manufacturing, vol. 15, no. 4, pp. 454-463, Nov. 2002.
• M. Freed, M. Kruger, C. J. Spanos, and K. Poolla, "Autonomous on-wafer sensors for process modeling, diagnosis, and control," IEEE Trans. Semiconductor Manufacturing, vol. 14, no. 3, pp. 255-264, Aug. 2001.
• X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, "Specular spectroscopic scatterometry," IEEE Trans. Semiconductor Manufacturing, vol. 14, no. 2, pp. 97-111, May 2001.
• N. Jakatdar, X. Niu, H. Zhang, J. Bao, and C. J. Spanos, "Novel metrology for the DUV photolithography sequence," AIP Conf. Proc., vol. 449, pp. 548-552, Nov. 1998.
• Z. Lin, C. J. Spanos, L. S. Milor, and Y. T. Lin, "Circuit sensititvity to interconnect variation," IEEE Trans. Semiconductor Manufacturing, vol. 11, no. 4, pp. 557-568, Nov. 1998.
• S. Leang and C. J. Spanos, "A general equipment diagnostic system and its application on photolithographic sequences," IEEE Trans. Semiconductor Manufacturing, vol. 10, no. 3, pp. 329-343, Aug. 1997.
• C. J. Spanos and R. L. Chen, "Using qualitative observations for process tuning and control," IEEE Trans. Semiconductor Manufacturing, vol. 10, no. 2, pp. 307-316, May 1997.
• C. Yu, H. Liu, and C. J. Spanos, "Patterning tool characterization by causal variability decomposition," IEEE Trans. Semiconductor Manufacturing, vol. 9, no. 4, pp. 527-535, Nov. 1996.
• S. Leang, S. Ma, J. Thomson, B. J. Bombay, and C. J. Spanos, "A control system for photolithographic sequences," IEEE Trans. Semiconductor Manufacturing, vol. 9, no. 2, pp. 191-207, May 1996.
• E. Palmer, W. Ren, C. J. Spanos, and K. Poolla, "Control of photoresist properties: A Kalman filter based approach," IEEE Trans. Semiconductor Manufacturing, vol. 9, no. 2, pp. 208-214, May 1996.
• A. J. Miranda and C. J. Spanos, "Impedance modeling of a Cl2/He plasma discharge for very large scale integrated circuit production monitoring," J. Vacuum Science and Technology A: Vacuum, Surfaces, and Films, vol. 14, no. 3, pp. 1888-1893, May 1996.
• R. Chen, B. Huang, C. J. Spanos, and M. Gatto, "Plasma etch modeling using optical emission spectroscopy," J. Vacuum Science and Technology A: Vacuum, Surfaces, and Films, vol. 14, no. 3, pp. 1901-1906, May 1996.
• S. Leang and C. J. Spanos, "A novel in-line automated metrology for photolithography," IEEE Trans. Semiconductor Manufacturing, vol. 9, no. 1, pp. 101-107, Feb. 1996.
• C. Yu, C. J. Spanos, H. Liu, and D. Bartelink, "Lithography error sources quantified by statistical metrology," Solid State Technology, vol. 39, no. 2, pp. 93-94, Feb. 1996.
• S. F. Lee and C. J. Spanos, "Prediction of wafer state after plasma processing using real-time tool data," IEEE Trans. Semiconductor Manufacturing, vol. 8, no. 3, pp. 252-261, Aug. 1995.
• S. P. Cunningham, C. J. Spanos, and K. Voros, "Semiconductor yield improvement: Results and best practices," IEEE Trans. Semiconductor Manufacturing, vol. 8, no. 2, pp. 103-109, May 1995.
• C. Yu, T. D. Maung, C. J. Spanos, D. S. Boning, J. E. Chung, H. Liu, K. Chang, and D. J. Bartelink, "Use of short-loop electrical measurements for yield improvement," IEEE Trans. Semiconductor Manufacturing, vol. 8, no. 2, pp. 150-159, May 1995.
• S. F. Lee, E. D. Boskin, H. C. Liu, E. H. Wen, and C. J. Spanos, "RTSPC: A software utility for real-time SPC and tool data analysis," IEEE Trans. Semiconductor Manufacturing, vol. 8, no. 1, pp. 17-25, Feb. 1995.
• E. D. Boskin, C. J. Spanos, and G. J. Korsh, "A method for modeling the manufacturability of IC designs," IEEE Trans. Semiconductor Manufacturing, vol. 7, no. 3, pp. 298-305, Aug. 1994.
• G. S. May and C. J. Spanos, "Automated malfunction diagnosis of semiconductor fabrication equipment: A plasma etch application," IEEE Trans. Semiconductor Manufacturing, vol. 6, no. 1, pp. 28-40, Feb. 1993.
• C. J. Spanos, H. Guo, A. Miller, and J. Levine-Parrill, "Real-time statistical process control using tool data," IEEE Trans. Semiconductor Manufacturing, vol. 5, no. 4, pp. 308-318, Nov. 1992.
• C. J. Spanos, "Statistical process control in semiconductor manufacturing," Proc. IEEE, vol. 80, no. 6, pp. 819-830, June 1992.
• N. N. Tam, H. Y. Liu, N. N. Tam, H. Y. Liu, C. J. Spanos, and A. R. Neureuther, "A statistically based model of electron-beam exposed, chemically amplified negative resist," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 9, no. 6, pp. 3362-3369, Nov. 1991.
• G. S. May, J. Huang, and C. J. Spanos, "Statistical experimental design in plasma etch modeling," IEEE Trans. Semiconductor Manufacturing, vol. 4, no. 2, pp. 83-98, May 1991.
• Z. Ling, S. Leang, and C. J. Spanos, "A lithography workcell monitoring and modeling scheme," Microelectronic Engineering, vol. 13, no. 1-4, pp. 537-540, March 1991.
• C. J. Spanos, "Creating and using equipment models in semiconductor manufacturing," Electronic Engineering, vol. 10, no. 3-4, pp. 199-205, Feb. 1991.
• C. J. Spanos, "Statistical process control in semiconductor manufacturing," Microelectronic Engineering, vol. 10, no. 3-4, pp. 271-276, Feb. 1991.
• N. H. Chang and C. J. Spanos, "Continuous equipment diagnosis using evidence integration: An LPCVD application," IEEE Trans. Semiconductor Manufacturing, vol. 4, no. 1, pp. 43-51, Feb. 1991.
• K. Lin and C. J. Spanos, "Statistical equipment modeling for VLSI manufacturing: an application for LPCVD," IEEE Trans. Semiconductor Manufacturing, vol. 3, no. 4, pp. 216-229, Nov. 1990.
• C. J. Spanos, "Statistical significance of error-corrupted IC measurements," IEEE Trans. Semiconductor Manufacturing, vol. 2, no. 1, pp. 23-28, Feb. 1989.

Articles in conference proceedings

• J. Xue and C. J. Spanos, "An integrated aerial image sensor for lithography diagnostics," in Proc. 2007 Intl. Workshop on Electron Devices and Semiconductor Technology (IEDST 2007), T. Ren, J. Xu, and C. Yang, Eds., Piscataway, NJ: IEEE Press, 2007, pp. 96-100.
• Q. Zhang, P. Friedberg, K. Poolla, and C. J. Spanos, "Enhanced spatial PEB uniformity through a novel bake plate design," in Proc. AEC/APC XVII Symp. 2005, Austin, TX: AEC/APC Official Proceedings CD-ROM, 2005, pp. 1-5.
• P. Friedberg, Y. Cao, J. Cain, R. Wang, J. M. Rabaey, and C. J. Spanos, "Modeling within-die spatial correlation effects for process-design co-optimization," in Proc. 6th Intl. Symp. on Quality of Electronic Design (ISQED '05), Los Alamitos, CA: IEEE Computer Society, 2005, pp. 516-521.
• S. Wang, P. MacDonald, M. Kruger, C. J. Spanos, and M. Welch, "CD uniformity improvement and IC process monitoring by wireless sensor technology," in Proc. 7th Intl. Conf. on Solid-State and Integrated Circuits Technology (ICSICT 2004), R. Huang, M. Yu, J. Liou, T. Hiramoto, and C. Claeys, Eds., Vol. 1, Piscataway, NJ: IEEE Press, 2004, pp. 538-541.
• M. V. P. Kruger, K. Poolla, and C. J. Spanos, "A class of impedance tomography based sensors for semiconductor manufacturing," in Proc. 2004 American Control Conf. (ACC '04), Vol. 3, Evanston, IL: American Automatic Control Council, 2004, pp. 2178-2183.
• R. Chang, Y. Cao, and C. J. Spanos, "Modeling metal dishing for interconnect optimization," in 2003 IEEE Intl. Electron Devices Meeting Technical Digest (IEDM '03), Piscataway, NJ: IEEE Press, 2003, pp. 249-252.
• M. V. P. Kruger, K. Poolla, and C. J. Spanos, "Electrical impedance tomography based sensors for semiconductor manufacturing," in Proc. 2002 American Control Conf. (ACC '02), Vol. 5, Evanston, IL: American Automatic Control Council, 2002, pp. 3678-3683.
• R. Chang and C. J. Spanos, "Full profile inter-layer dielectric CMP analysis," in Proc. 2001 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 2001), Piscataway, NJ: IEEE Press, 2001, pp. 133-136.
• C. J. Spanos, P. Jula, and R. C. Leachman, "The economic impact of choosing off-line, inline or in situ metrology deployment in semiconductor manufacturing," in Proc. 2001 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 2001), Piscataway, NJ: IEEE Press, 2001, pp. 37-40.
• M. Freed, M. Kruger, K. Poolla, and C. J. Spanos, "Real time in-situ data acquisition using atonomous on-wafer sensor arrays," in Proc. 9th Intl. Symp. on Semiconductor Manufacturing (ISSM 2000), Tokyo, Japan: Ultra Clean Society Press, 2000, pp. 94-97.
• J. Wang and C. J. Spanos, "A sensor fusion based methodology for real time furnace diagnostics," in Proc. 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '00), Piscataway, NJ: IEEE Press, 2000, pp. 397-406.
• M. V. P. Kruger, M. H. Guddal, R. Belikov, A. Bhatnagar, O. Solgaard, C. J. Spanos, and K. Poolla, "Low power wireless readout of autonomous sensor wafer using MEMS grating light modulator," in Proc. 2000 IEEE/LEOS Intl. Conf. on Optical MEMS, Piscataway, NJ: IEEE Press, 2000, pp. 67-68.
• D. Fisher, M. Freed, C. J. Spanos, and K. Poolla, "Autonomous micro-sensor arrays for process control of semiconductor manufacturing processes," in Proc. 38th Conf. on Decision and Control (CDC 1999), Vol. 4, Piscataway, NJ: IEEE Press, 1999, pp. 4179-4184.
• D. Fisher, M. Freed, C. J. Spanos, and K. Poolla, "Micro-sensor arrays for calibration, control, and monitoring of semiconductor manufacturing processes," in Proc. 1999 IEEE Intl. Conf. on Control Applications (1999 CCA), Vol. 1, Piscataway, NJ: IEEE Press, 1999, pp. 784-788.
• M. Orshansky, C. Hu, and C. J. Spanos, "Circuit performance variability decomposition," in Proc. 4th Intl. Workshop on Statistical Metrology (IWSM 1999), Piscataway, NJ: IEEE Press, 1999, pp. 10-13.
• Z. J. Lin and C. J. Spanos, "Sensitivity study of interconnect variation using statistical experimental design," in Proc. 3rd Intl. Workshop on Statistical Metrology (IWSM 1998), Gaithersburg, MD: Widerkehr and Associates, 1998, pp. 68-71.
• S. Rangan, C. J. Spanos, and K. Poolla, "Modeling and filtering of optical emission spectroscopy data for plasma etching systems," in Proc. 1997 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 1997), Piscataway, NJ: IEEE Press, 1997, pp. B41-44.
• J. Musacchio, S. Rangan, C. J. Spanos, and K. Poolla, "On the utility of run to run control in semiconductor manufacturing," in Proc. 1997 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 1997), Piscataway, NJ: IEEE Press, 1997, pp. D9-12.
• R. Chen, S. Rangan, and C. J. Spanos, "Spatially resolved endpoint detector for plasma etcher," in 1997 IEEE Intl. Symp. on Semiconductor Manufacturing Conf. Proc., Piscataway, NJ: IEEE Press, 1997, pp. B45-B48.
• A. M. Ison, W. Li, and C. J. Spanos, "Fault diagnosis of plasma etch equipment," in 1997 IEEE Intl. Symp. on Semiconductor Manufacturing Conf. Proc., Piscataway, NJ: IEEE Press, 1997, pp. B49-B52.
• S. Rangan, C. J. Spanos, and K. Poolla, "Modeling and filtering of optical emission spectroscopy data for plasma etching systems," in Proc. 16th American Control Conf. (ACC 1997), Vol. 1, Evanston, IL: American Automatic Control Council, 1997, pp. 627-628.
• Z. Lin, C. J. Spanos, L. S. Milor, and Y. Lin, "Study of circuit sensitivity to interconnect variation," in Proc. 2nd Intl. Workshop on Statistical Metrology (IWSM 1997), Piscataway, NJ: IEEE Press, 1997, pp. 28-31.
• C. Yu, H. Liu, and C. J. Spanos, "Manufacturability evaluation of deep submicron exposure tools using statistical metrology," in Proc. IEEE/UCS/SEMI Intl. Symp. on Semiconductor Manufacturing, Piscataway, NJ: IEEE Press, 1995, pp. 222-225.
• P. Tsai, C. J. Spanos, and F. Nadi, "A neural net based, in-line focus/exposure monitor," in Proc. 1994 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '94), Piscataway, NJ: IEEE Press, 1994, pp. 305-310.
• Z. Daoud and C. J. Spanos, "DORIC: Design of Optimal and Robust Integrated Circuits," in Proc. 1994 IEEE Custom Integrated Circuits Conf. (CICC '94), Piscataway, NJ: IEEE Press, 1994, pp. 361-364.
• R. L. Chen and C. J. Spanos, "Statistical data pre-processing for fuzzy modeling of semiconductor manufaturing process," in Proc. 3rd Intl. Conf. on Industrial Fuzzy Control and Intelligent Systems (IFIS '93), R. Langari, J. Yen, and J. Painter, Eds., Piscataway, NJ: IEEE Press, 1993, pp. 6-11.
• C. J. Spanos, S. Leang, and S. Lee, "A control and diagnosis scheme for semiconductor manufacturing," in Proc. 1993 American Control Conf. (ACC '93), Evanston, IL: American Automatic Control Council, 1993, pp. 3008-3012.
• E. D. Boskin, C. J. Spanos, and G. Korsh, "A method for modeling the manufacturability of IC designs," in Proc. 1993 IEEE Intl. Conf. on Microelectronic Test Structures (ICMTS '93), Piscataway, NJ: IEEE Press, 1993, pp. 241-246.
• S. Leang and C. J. Spanos, "Application of feed-forward and feedback control to a photolithograpy sequence," in Proc. 3rd IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '92), Piscataway, NJ: IEEE Press, 1992, pp. 143-147.
• R. L. Chen and C. J. Spanos, "Self-learning fuzzy modeling of semiconductor processing equipment," in Proc. 3rd IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '92), Piscataway, NJ: IEEE Press, 1992, pp. 100-106.
• E. D. Boskin, C. J. Spanos, and G. Korsh, "IC performance prediction from electrical test measurements," in Proc. 4th IEEE/SEMI Intl. Semiconductor Manufacturing Science Symp. (ISMSS 1992), Piscataway, NJ: IEEE Press, 1992, pp. 13-17.
• S. Leang and C. J. Spanos, "Application of feed-forward control to a lithography stepper," in Proc. 4th IEEE/SEMI Intl. Semiconductor Manufacturing Science Symp. (ISMSS 1992), Piscataway, NJ: IEEE Press, 1992, pp. 79-84.
• S. Leang and C. J. Spanos, "Statistically based feedback control of photoresist application," in Proc. 2nd IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '91), Piscataway, NJ: IEEE Press, 1991, pp. 185-190.
• G. S. May and C. J. Spanos, "Automated malfunction diagnosis of a plasma etcher," in Proc. 3rd Annual IEEE/SEMI Intl. Symp. on Semiconductor Manufacturing Science Symp. (ISMSS 1991), Piscataway, NJ: IEEE Press, 1991, pp. 62-68.
• H. Guo, C. J. Spanos, and A. J. Miller, "Real time statistical process control for plasma etching," in Proc. 3rd IEEE/SEMI Intl. Semiconductor Manufacturing Science Symp. (ISMSS 1991), Piscataway, NJ: IEEE Press, 1991, pp. 113-118.
• G. S. May, J. Huang, and C. J. Spanos, "Experimental modeling of the etch characteristics of polysilicon in CCl4/He/O2 plasmas," in Proc. 9th IEEE/CHMT Intl. Electronic Manufacturing Technology Symp. (IEMT 1990), Piscataway, NJ: IEEE Press, 1990, pp. 73-76.
• K. Lin and C. J. Spanos, "Computer-aided recipe generation for LPCVD reactors," in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '90), Piscataway, NJ: IEEE Press, 1990, pp. 61-62.
• N. H. Chang and C. J. Spanos, "Continuous diagnosis of low-pressure chemical vapor deposition reactors using evidence integration," in 1990 Symp. on VLSI Technology (VLSI '90). Digest of Technical Papers, Piscataway, NJ: IEEE Press, 1990, pp. 101-102.
• D. A. Hodges, L. A. Rowe, and C. J. Spanos, "Computer integrated manufacturing," in Proc. 7th IEEE/CHMT Intl. Electronic Manufacturing Technology Symp. (IEMT 1989), Piscataway, NJ: IEEE Press, 1989, pp. 1-3.
• C. J. Spanos, "Hippocrates: A methodology for IC process diagnosis," in IEEE Intl. Conf. on Computer-Aided Design (ICCAD-86). Digest of Technical Papers, Washington, DC: IEEE Computer Society Press, 1986, pp. 513-516.
• S. W. Director and C. J. Spanos, "PROMETHEUS: A program for VLSI process parameter extraction," in IEEE Intl. Conf. on Computer-Aided Design (ICCAD-83). Digest of Technical Papers, Piscataway, NJ: IEEE Press, 1983, pp. 176-177.

Technical Reports

• C. J. Spanos, J. Chen, R. Chen, C. Fields, H. Huang, A. Ison, X. Niu, D. Park, J. Tao, M. Terrovitis, and A. Wang, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M95/64, 1995.
• C. J. Spanos, J. Chen, M. Cohn, M. Hatzilambrou, A. Miranda, and R. Schenker, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M95/63, 1995.
• C. J. Spanos, J. Hutchinson, P. Tsai, H. Wann, and M. Zuniga, "Special Issues in Semiconductor Manufacturing IV," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M94/2, 1994.
• A. R. Neureuther, C. J. Spanos, M. Hatzilambrou, and C. Yu, "White Paper Concurrent Circuit Design/ Process Engineering in a Flexible Manufacturing Environment," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M93/91, 1993.
• C. J. Spanos, B. Bombay, S. Cunningham, Z. Daoud, J. Helmsen, J. King, H. Liu, D. Newmark, J. Noriega-Asturias, J. Thomson, C. Yu, E. Boskin, and D. Hebert, "Special Issues in Semiconductor Manufacturing III," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M92/84, 1992.
• C. J. Spanos, E. Boskin, R. Chen, Z. Daoud, and H. Liu, "IC Design for Manufacturability 1," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M92/17, 1992.
• C. J. Spanos, R. Chen, S. Leang, and N. Tam, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M91/8, 1991.
• C. J. Spanos, E. Boskin, Y. Fong, T. Garfinkel, H. Guo, C. Hegarty, T. Hu, S. Lee, T. Luan, G. May, J. Ramirez, and E. Rosenbaum, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M90/8, 1990.

Patents

• M. L. Freed, R. L. Mundt, and C. J. Spanos, "Sensor apparatus management methods and apparatus," U.S. Patent Application. March 2006.
• K. Poolla and C. J. Spanos, "Methods of and apparatus for controlling process profiles," U.S. Patent 7,016,754. March 2006.
• R. S. Mundt, P. D. MacDonald, A. Beers, M. L. Freed, and C. J. Spanos, "Methods of and apparatuses for measuring electrical parameters of a plasma process," U.S. Patent Application. Nov. 2005.
• K. Poolla and C. J. Spanos, "Methods of and apparatuses for controlling process profiles," U.S. Patent Application. Sep. 2005.
• P. D. MacDonald, M. V. P. Kruger, M. Welch, M. L. Freed, and C. J. Spanos, "Methods of and apparatuses for maintenance, diagnosis, and optimization of processes," U.S. Patent Application. July 2005.
• D. Hunt, C. J. Spanos, M. Welch, K. Poolla, and M. L. Freed, "Methods and apparatus for low distortion parameter measurements," U.S. Patent Application. July 2005.
• M. L. Freed, R. S. Mundt, and C. J. Spanos, "Sensor apparatus management methods and apparatus," U.S. Patent Application. July 2004.
• K. Poolla and C. J. Spanos, "Sensor methods and apparatus," U.S. Patent Application. May 2004.
• K. Poolla and C. J. Spanos, "Sensor geometry correction methods and apparatus," U.S. Patent 6,741,945. May 2004.
• K. Poolla and C. J. Spanos, "Data collection and corrrection methods and apparatus," U.S. Patent 6,738,722. May 2004.
• M. L. Freed, R. S. Mundt, and C. J. Spanos, "Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control," U.S. Patent 6,691,068. Feb. 2004.