Faculty Publications - Kameshwar Poolla

Book chapters or sections

• N. Ma, J. Ghan, S. Mishra, C. J. Spanos, K. Poolla, N. Rodriguez, and L. Capodieci, "Automatic hotspot classification using pattern-based clustering," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 05-1-10.
• Q. Zhang, K. Poolla, and C. J. Spanos, "Modeling of mask thermal distortion and its dependency on pattern density," in Photomask and Next-Generation Lithography Mask Technology XII, M. Komuro, Ed., Proceedings of SPIE, Vol. 5853, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 234-242.
• Q. Zhang, C. Tang, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, and C. J. Spanos, "Comprehensive CD uniformity control across lithography and etch," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 692-701.
• Q. Zhang, P. D. Friedberg, C. Tang, B. Singh, K. Poolla, and C. J. Spanos, "Across-wafer CD uniformity enhancement through control of multizone PEB profiles," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 276-286.

Articles in journals or magazines

• Q. Zhang, K. Poolla, and C. J. Spanos, "One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process," J. Process Control, vol. 18, pp. 9 pg, Dec. 2008.
• Q. Zhang, K. Poolla, and C. J. Spanos, "Across wafer critical dimension uniformity enhancement through lithography and etch process sequence: Concept, approach, modeling, and experiment (2007 TSM Best Paper Award)," IEEE Trans. Semiconductor Manufacturing, vol. 20, no. 4, pp. 488-505, Nov. 2007.
• L. Schenato, B. Sinopoli, M. Franceschetti, K. Poolla, and S. S. Sastry, "Foundations of control and estimation over lossy networks," Proc. IEEE, vol. 95, no. 1, pp. 163-187, Jan. 2007.
• K. Hsu, C. Novara, T. Vincent, M. Milanese, and K. Poolla, "Parametric and nonparametric curve fitting," Automatica, vol. 42, no. 11, pp. 1869-1873, Nov. 2006.
• M. Freed, M. V. P. Kruger, C. J. Spanos, and K. Poolla, "Wafer-grown heat flux sensor arrays for plasma etch processes," IEEE Trans. Semiconductor Manufacturing, vol. 18, no. 1, pp. 148-162, Feb. 2005.
• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, M. Jordan, and S. S. Sastry, "Kalman filtering with intermittent observations," IEEE Trans. Automatic Control: Special Issue on Sensor Networks, vol. 49, no. 9, pp. 1453-1464, Sep. 2004.
• M. Freed, M. Kruger, C. J. Spanos, and K. Poolla, "Autonomous on-wafer sensors for process modeling, diagnosis, and control," IEEE Trans. Semiconductor Manufacturing, vol. 14, no. 3, pp. 255-264, Aug. 2001.
• E. Palmer, W. Ren, C. J. Spanos, and K. Poolla, "Control of photoresist properties: A Kalman filter based approach," IEEE Trans. Semiconductor Manufacturing, vol. 9, no. 2, pp. 208-214, May 1996.
• K. Poolla and A. Tikku, "Robust performance against slowly-varying structured perturbations," IEEE Trans. Automatic Control, vol. 40, no. 9, pp. 1589-1602, Sep. 1995.
• K. Poolla, P. Khargonekar, A. Tikku, J. Krause, and K. Nagpal, "A time-domain approach to model validation," IEEE Trans. Automatic Control, vol. 39, no. 5, pp. 951-959, May 1994.

Articles in conference proceedings

• K. Hsu, T. Vincent, and K. Poolla, "Experiment design for structured nonlinear system identification," in Proc. 2007 American Control Conf. (ACC '07), Piscataway, NJ: IEEE Press, 2007, pp. 1554-1559.
• B. Zhu, B. Sinopoli, K. Poolla, and S. S. Sastry, "Estimation over wireless sensor networks," in Proc. 2007 American Control Conf. (ACC '07), Dayton, OH: American Automatic Control Council, 2007, pp. 2732-2737.
• K. Hsu, T. Vincent, and K. Poolla, "Robust structured nonlinear system identification," in Proc. 45th IEEE Conf. on Decision and Control (CDC 2006), Piscataway, NJ: IEEE Press, 2006, pp. 2518-2522.
• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, and S. S. Sastry, "Optimal linear LQG control over lossy networks without packet acknowledgment," in Proc. 45th IEEE Decision and Control Conf. (CDC 2006), Piscataway, NJ: IEEE Press, 2006, pp. 392-397.
• M. Milanese, C. Novara, K. Hsu, and K. Poolla, "Filter design from data: Direct vs. two-step approaches," in Proc. 2006 American Control Conf. (ACC '06), Piscataway, NJ: IEEE Press, 2006, pp. 4466-4470.
• K. Hsu, T. Vincent, and K. Poolla, "A kernel based approach to structured nonlinear system identification. Part I. Algorithms," in Proc. 14th IFAC Symp. on System Identification (SYSID 2006), B. Ninness and H. Hjalmarsson, Eds., Amsterday, The Nethelands: Elsevier Science Ltd., 2006, pp. 6 pg.
• K. Hsu, T. Vincent, and K. Poolla, "A kernel based approach to structured nonlinear system identification. Part II. Convergence and consistency," in Proc.14th IFAC Symp. on System Identification (SYSID 2006), B. Ninness and H. Hjalmarsson, Eds., Amsterdam, The Netherlands: Elsevier Science Ltd., 2006, pp. 6 pg.
• C. Novara, M. Milanese, K. Hsu, and K. Poolla, "Nonlinear virtual sensors design from data (Invited Paper)," in Proc.14th IFAC Symp. on System Identification (SYSID 2006), B. Ninness and H. Hjalmarsson, Eds., Amsterdam, The Netherlands: Elsevier Science Ltd., 2006, pp. 6 pg.
• Q. Zhang, P. Friedberg, K. Poolla, and C. J. Spanos, "Enhanced spatial PEB uniformity through a novel bake plate design," in Proc. AEC/APC XVII Symp. 2005, Austin, TX: AEC/APC Official Proceedings CD-ROM, 2005, pp. 1-5.
• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, and S. S. Sastry, "Optimal control with unreliable communication: The TCP case," in Proc. 2005 American Control Conf. (ACC '05), Vol. 5, Evanston, IL: American Automatic Control Council, 2005, pp. 3354-3359.
• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, and S. S. Sastry, "Time varying optimal control with packet losses," in Proc. 43rd IEEE Conf. on Decision and Control (CDC 2004), Vol. 2, Piscataway, NJ: IEEE Press, 2004, pp. 1938-1943.
• M. V. P. Kruger, K. Poolla, and C. J. Spanos, "A class of impedance tomography based sensors for semiconductor manufacturing," in Proc. 2004 American Control Conf. (ACC '04), Vol. 3, Evanston, IL: American Automatic Control Council, 2004, pp. 2178-2183.
• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, M. Jordan, and S. S. Sastry, "Kalman filtering with intermittent observations," in Proc. 42nd IEEE Intl. Conf. on Decision and Control (CDC 2003), Vol. 1, Piscataway, NJ: IEEE Press, 2003, pp. 701-708.
• M. V. P. Kruger, K. Poolla, and C. J. Spanos, "Electrical impedance tomography based sensors for semiconductor manufacturing," in Proc. 2002 American Control Conf. (ACC '02), Vol. 5, Evanston, IL: American Automatic Control Council, 2002, pp. 3678-3683.
• M. Freed, M. Kruger, K. Poolla, and C. J. Spanos, "Real time in-situ data acquisition using atonomous on-wafer sensor arrays," in Proc. 9th Intl. Symp. on Semiconductor Manufacturing (ISSM 2000), Tokyo, Japan: Ultra Clean Society Press, 2000, pp. 94-97.
• M. V. P. Kruger, M. H. Guddal, R. Belikov, A. Bhatnagar, O. Solgaard, C. J. Spanos, and K. Poolla, "Low power wireless readout of autonomous sensor wafer using MEMS grating light modulator," in Proc. 2000 IEEE/LEOS Intl. Conf. on Optical MEMS, Piscataway, NJ: IEEE Press, 2000, pp. 67-68.
• D. Fisher, M. Freed, C. J. Spanos, and K. Poolla, "Autonomous micro-sensor arrays for process control of semiconductor manufacturing processes," in Proc. 38th Conf. on Decision and Control (CDC 1999), Vol. 4, Piscataway, NJ: IEEE Press, 1999, pp. 4179-4184.
• D. Fisher, M. Freed, C. J. Spanos, and K. Poolla, "Micro-sensor arrays for calibration, control, and monitoring of semiconductor manufacturing processes," in Proc. 1999 IEEE Intl. Conf. on Control Applications (1999 CCA), Vol. 1, Piscataway, NJ: IEEE Press, 1999, pp. 784-788.
• S. Rangan, C. J. Spanos, and K. Poolla, "Modeling and filtering of optical emission spectroscopy data for plasma etching systems," in Proc. 1997 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 1997), Piscataway, NJ: IEEE Press, 1997, pp. B41-44.
• J. Musacchio, S. Rangan, C. J. Spanos, and K. Poolla, "On the utility of run to run control in semiconductor manufacturing," in Proc. 1997 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 1997), Piscataway, NJ: IEEE Press, 1997, pp. D9-12.
• S. Rangan, C. J. Spanos, and K. Poolla, "Modeling and filtering of optical emission spectroscopy data for plasma etching systems," in Proc. 16th American Control Conf. (ACC 1997), Vol. 1, Evanston, IL: American Automatic Control Council, 1997, pp. 627-628.

Technical Reports

• B. Sinopoli, L. Schenato, M. Franceschetti, K. Poolla, M. Jordan, and S. S. Sastry, "Kalman Filtering with Intermittent Observations," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M03/15, 2003.

Patents

• K. Poolla and C. J. Spanos, "Methods of and apparatuses for controlling process profiles," U.S. Patent 7,403,834. July 2008. [abstract]
• D. Hunt, C. J. Spanos, M. Welch, K. Poolla, and M. L. Freed, "Methods and apparatus for low distortion parameter measurements," U.S. Patent 7,299,148. Nov. 2007. [abstract]
• K. Poolla, "Method and apparatus for equipment matching and characterization," U.S. Patent 7,212,950. May 2007. [abstract]
• K. Poolla and C. J. Spanos, "Methods of and apparatus for controlling process profiles," U.S. Patent 7,016,754. March 2006. [abstract]
• K. Poolla and R. S. Mundt, "Methods and apparatus for deriving thermal flux data for processing a workpiece," U.S. Patent 6,907,364. June 2005.
• K. Poolla and C. J. Spanos, "Sensor geometry correction methods and apparatus," U.S. Patent 6,741,945. May 2004.
• K. Poolla and C. J. Spanos, "Data collection and corrrection methods and apparatus," U.S. Patent 6,738,722. May 2004.