Faculty Publications - Andrew R. Neureuther

Book chapters or sections

Articles in journals or magazines

Articles in conference proceedings

  • N. Xu, X. Sun, L. Wang, A. R. Neureuther, and T. King Liu, "Predictive compact modeling for strain effects in nanoscale transistors," in 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2009), 2009. [abstract]
  • J. Yang and A. R. Neureuther, "Crosstalk noise variation assessment and analysis for the worst process corner," in Proc. 9th IEEE Intl. Symp. on Quality Electronic Design (ISQED 2008), Los Alamitos, CA: IEEE Computer Society, 2008, pp. 352-356.
  • D. P. Ceperley and A. R. Neureuther, "Simulating novel EM effects," in Proc. 2007 IEEE Intl. Semiconductor Device Research Symp. (ISDRS '07), Piscataway, NJ: IEEE Press, 2007, pp. 2 pg.
  • L. Yuan, S. Nagahara, and A. R. Neureuther, "Applying double exposed sharp tip technique (DEST) to characterize material phenomena in DUV photoresist," in Proc. SPIE: Advances in Resist Technology and Processing XXII, J. L. Sturtevant, Ed., Vol. 5753, Bellingham, WA: SPIE, 2005, pp. 1108-1118.
  • M. C. Lam and A. R. Neureuther, "Fast simulation methods for defective EUV mask blank inspection," in Proc. SPIE: 24th Annual BACUS Symp. on Photomask Technology, W. Staud and J. T. Weed, Eds., Vol. 5567, Bellingham, WA: SPIE, 2004, pp. 741-750.
  • G. C. Robins and A. R. Neureuther, "Characterizing the demons in high-NA phase-shifting masks (Conference Best Paper Award)," in Proc. SPIE: 24th Annual BACUS Symp. on Photomask Technology, W. Staud and J. T. Weed, Eds., Vol. 5567, Bellingham, WA: SPIE, 2004, pp. 445-455.
  • K. Adam and A. R. Neureuther, "Methodology for accurate and rapid simulation of large arbitrary 2D layouts of advanced photomasks," in Proc. SPIE: 21st Annual BACUS Symp. on Photomask Technology, G. T. Dao and B. J. Grenon, Eds., Vol. 4562, Bellingham, WA: SPIE, 2002, pp. 1051-1067.
  • F. E. Gennari and A. R. Neureuther, "Aberrations are a big part of OPC for phase-shifting masks," in Proc. SPIE: 21st Annual BACUS Symp. on Photomask Technology, G. T. Dao and B. J. Grenon, Eds., Vol. 4562, Bellingham, WA: SPIE, 2002, pp. 1077-1086.
  • K. Adam and A. R. Neureuther, "Simplified models for edge transitions in rigorous mask modeling," in Proc. SPIE: Optical Microlithography XIV, C. J. Progler, Ed., Vol. 4346, Bellingham, WA: SPIE, 2001, pp. 331-344.
  • A. R. Neureuther, R. H. Wang, J. J. Helmsen, J. F. Sefler, E. W. Scheckler, R. Gunturi, and R. Winterbottom, "3D topography simulation using surface representation and central utilities," in 3-Dimensional Process Simulation: Proc. Intl. Workshop on 3D Process Simulation, J. Lorenz, Ed., Wien, Austria: Springer-Verlag, 1995, pp. 57-76.
  • K. H. Toh and A. R. Neureuther, "Identifying and monitoring effects of lens aberrations in projection printing," in Proc. SPIE: Optical Microlithography VI, H. L. Stover, Ed., Vol. 772, Bellingham, WA: SPIE, 1987, pp. 202-209.
  • M. D. Prouty and A. R. Neureuther, "Optical imaging with phase shift masks," in Proc. of the SPIE: Optical Microlithography III: Technology for the Next Decade, H. L. Stover, Ed., Vol. 470, Bellingham, WA: SPIE, 1984, pp. 228-232.
  • A. R. Neureuther and K. Zaki, "Numerical methods for the analysis of scattering from non-planar periodic structures," in Selected Papers from the URSI Symp. on Electromagnetic Waves, Alta Frequenza, Special Issue, Vol. 38, Maggio, 1969, pp. 282-285.

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