List of Abstracts for Andrew R. Neureuther
The EECS Research Summary for 2003
Measuring Optical Image Aberrations with Pattern and Probe Based Targets
Garth Robins
A Pattern Matcher for Locating Areas in Lithographic Masks Sensitive to Lens Aberrations
Frank E. Gennari
Polarization Masks: Monitors and High-Resolution Structures
Michael Lam
Enhanced Quantitative Analysis of Resist Image Contrast upon Line Edge Roughness (LER)
Mike Williamson
Immersion Lithography
Scott Hafeman
(5 abstracts total)