Contents of Chapter 4: Integrated Circuits
The EECS Research Summary for 2003
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Contents
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Title
Author(s)
Professor(s)
Advanced EUV Imaging
Michael D. Shumway
Jeffrey Bokor
Maskless Lithography with Nanodroplets
Yan Wang
Jeffrey Bokor
2 DOF MEMS Laser Beam Steering System for Optical Communication Links
Baris Cagdaser
Bernhard E. Boser
Digital Calibration for Low-Power High-Performance A/D Conversion
Boris Murmann
Bernhard E. Boser
5V Electrostatic Actuator Design for MEMS Gyroscope Application
Joe Seeger
Bernhard E. Boser
Electronic Interfaces for Resonant Strain/Force Sensors
Ken Wojciechowski
Bernhard E. Boser
Closed-Loop Sense Architecture for Micromachined Gyroscopes
Vladimir Petkov
Bernhard E. Boser
Energy-Delay Tradeoffs in Combinational Logic Using Gate Sizing and Supply Voltage Optimization
Dejan Markovic
Robert W. Brodersen
Borivoje Nikolic
An Integrated, Low Power, Ultra-Wideband Transceiver for Low-Rate, Indoor Wireless Systems
Ian D. O'Donnell
Mike S. W. Chen
Stanley B. T. Wang
Robert W. Brodersen
UWB Baseband Implementation and System Design
Mike Chen
Robert W. Brodersen
UWB Front-End Antenna/Circuit Co-Design
Stanley Wang
Robert W. Brodersen
Next Generation Highly Integrated Wireless Sensor Network Platform
Jason Hill
David E. Culler
LMS Adaptive Digital Background Calibration of Pipelined A/D Converters
Yun Chiu
Cheongyuen (Bill) Tsang
Abhishek Somani
Paul R. Gray
Borivoje Nikolic
Parallel Path Receiver Architecture for 60 GHz Radio Systems
Cheol-Woong Lee
Paul R. Gray
Transmitter Linearization for Portable Wireless Communications Systems
Luns Tee
Paul R. Gray
Power Amplifiers Efficiency Enhancement
Naratip Wongkomet
Paul R. Gray
High Performance A/D Interface Circuits for Wireless Applications
Yun Chiu
Paul R. Gray
Wideband CMOS LC VCOs
Axel Berny
Robert G. Meyer
Ali Niknejad
Analysis of ACPR in Linear RF Power Amplifiers
Burcin Baytekin
Robert G. Meyer
High Linearity Broadband MOS Attenuator Design
Hakan Dogan
Robert G. Meyer
CMOS Sub-Harmonic Mixers
Henry C. Jen
Robert G. Meyer
A Pattern Matcher for Locating Areas in Lithographic Masks Sensitive to Lens Aberrations
Frank E. Gennari
Andrew R. Neureuther
Measuring Optical Image Aberrations with Pattern and Probe Based Targets
Garth Robins
Andrew R. Neureuther
Polarization Masks: Monitors and High-Resolution Structures
Michael Lam
Andrew R. Neureuther
Immersion Lithography
Scott Hafeman
Andrew R. Neureuther
Data Handling Architecture for Maskless Lithography Systems
Benny Warlick
Borivoje Nikolic
Architectures for Joint Iterative Decoding Algorithms
Edward Liao
Borivoje Nikolic
Architectures and VLSI Implementations of High Throughput of Iterative Decoders
Engling Yeo
Borivoje Nikolic
Optimal Control of Supply and Threshold Voltages for Variable-Throughput Systems
Fujio Ishihara
Joshua Garrett
Borivoje Nikolic
Simple Parameter Extraction for Short Channel FET Current and Delay Models
Joshua Garrett
Borivoje Nikolic
Power-Area-Delay Tradeoffs for CMOS Arithmetic Circuits
Radu Zlatanovici
Borivoje Nikolic
Robustness in High-Speed Circuit Design
Socrates Vamvakos
Borivoje Nikolic
Design, Control and Fabrication of Nanomirrors for EUV Maskless Lithography
Yijian Chen
William G. Oldham
Ultra-Low Energy Circuits for Distributed Sensor Networks (Smart Dust)
Brett Warneke
Mike Scott
Brian Leibowitz
Kristofer S. J. Pister
SOI/SOI Wafer Bonding Process for Making Scanning Micromirror
Lixia Zhou
Kristofer S. J. Pister
Low-Power RF Transceiver for Wireless Sensor Nodes
Brian P. Otis
Jan M. Rabaey
Reliable VLSI Design in the Nanometer Regime
Huifang Qin
Ruth Wang
Jan M. Rabaey
Algorithms and VLSI Implementations of Low Power Digital Baseband Timing Recovery Systems for Wireless Communications
M. Josie Ammer
Jan M. Rabaey
Power Management for Low-Power Sensor Nodes
Michael Sheets
Jan M. Rabaey
A Low Power Low Noise Amplifier for Wireless Sensor Nodes
Richard Lu
Jan M. Rabaey
Implementation of a Locationing Engine for Low Power Sensor Nodes
Tufan Karalar
Jan M. Rabaey
Architecture and IC Implementation of Digital PWM Controller
Jinwen Xiao
Jianhui Zhang
Angel Peterchev
Seth R. Sanders
Manufacturing Issues in Extreme Ultraviolet Lithography
Jason Cain
Costas J. Spanos
Electrical Impedance Tomography Based Metrology for Semiconductor Manufacturing
Michiel Kruger
Costas J. Spanos
Proposed Framework for Lithography Process Control Using Prolith and Full-Profile Metrology
Paul Friedberg
Costas J. Spanos
Integrated CMP Metrology and Modeling with Respect to Circuit Performance
Runzi Chang
Costas J. Spanos
Josephson-CMOS Hybrid Memories Operating at 4 K
Qingguo Liu
Theodore Van Duzer