Contents of Chapter 4: Integrated Circuits

The EECS Research Summary for 2003

[Contents]
Title Author(s) Professor(s)
Advanced EUV Imaging Michael D. Shumway Jeffrey Bokor
Maskless Lithography with Nanodroplets Yan Wang Jeffrey Bokor
2 DOF MEMS Laser Beam Steering System for Optical Communication Links Baris Cagdaser Bernhard E. Boser
Digital Calibration for Low-Power High-Performance A/D Conversion Boris Murmann Bernhard E. Boser
5V Electrostatic Actuator Design for MEMS Gyroscope Application Joe Seeger Bernhard E. Boser
Electronic Interfaces for Resonant Strain/Force Sensors Ken Wojciechowski Bernhard E. Boser
Closed-Loop Sense Architecture for Micromachined Gyroscopes Vladimir Petkov Bernhard E. Boser
Energy-Delay Tradeoffs in Combinational Logic Using Gate Sizing and Supply Voltage Optimization Dejan Markovic Robert W. Brodersen
Borivoje Nikolic
An Integrated, Low Power, Ultra-Wideband Transceiver for Low-Rate, Indoor Wireless Systems Ian D. O'Donnell
Mike S. W. Chen
Stanley B. T. Wang
Robert W. Brodersen
UWB Baseband Implementation and System Design Mike Chen Robert W. Brodersen
UWB Front-End Antenna/Circuit Co-Design Stanley Wang Robert W. Brodersen
Next Generation Highly Integrated Wireless Sensor Network Platform Jason Hill David E. Culler
LMS Adaptive Digital Background Calibration of Pipelined A/D Converters Yun Chiu
Cheongyuen (Bill) Tsang
Abhishek Somani
Paul R. Gray
Borivoje Nikolic
Parallel Path Receiver Architecture for 60 GHz Radio Systems Cheol-Woong Lee Paul R. Gray
Transmitter Linearization for Portable Wireless Communications Systems Luns Tee Paul R. Gray
Power Amplifiers Efficiency Enhancement Naratip Wongkomet Paul R. Gray
High Performance A/D Interface Circuits for Wireless Applications Yun Chiu Paul R. Gray
Wideband CMOS LC VCOs Axel Berny Robert G. Meyer
Ali Niknejad
Analysis of ACPR in Linear RF Power Amplifiers Burcin Baytekin Robert G. Meyer
High Linearity Broadband MOS Attenuator Design Hakan Dogan Robert G. Meyer
CMOS Sub-Harmonic Mixers Henry C. Jen Robert G. Meyer
A Pattern Matcher for Locating Areas in Lithographic Masks Sensitive to Lens Aberrations Frank E. Gennari Andrew R. Neureuther
Measuring Optical Image Aberrations with Pattern and Probe Based Targets Garth Robins Andrew R. Neureuther
Polarization Masks: Monitors and High-Resolution Structures Michael Lam Andrew R. Neureuther
Immersion Lithography Scott Hafeman Andrew R. Neureuther
Data Handling Architecture for Maskless Lithography Systems Benny Warlick Borivoje Nikolic
Architectures for Joint Iterative Decoding Algorithms Edward Liao Borivoje Nikolic
Architectures and VLSI Implementations of High Throughput of Iterative Decoders Engling Yeo Borivoje Nikolic
Optimal Control of Supply and Threshold Voltages for Variable-Throughput Systems Fujio Ishihara
Joshua Garrett
Borivoje Nikolic
Simple Parameter Extraction for Short Channel FET Current and Delay Models Joshua Garrett Borivoje Nikolic
Power-Area-Delay Tradeoffs for CMOS Arithmetic Circuits Radu Zlatanovici Borivoje Nikolic
Robustness in High-Speed Circuit Design Socrates Vamvakos Borivoje Nikolic
Design, Control and Fabrication of Nanomirrors for EUV Maskless Lithography Yijian Chen William G. Oldham
Ultra-Low Energy Circuits for Distributed Sensor Networks (Smart Dust) Brett Warneke
Mike Scott
Brian Leibowitz
Kristofer S. J. Pister
SOI/SOI Wafer Bonding Process for Making Scanning Micromirror Lixia Zhou Kristofer S. J. Pister
Low-Power RF Transceiver for Wireless Sensor Nodes Brian P. Otis Jan M. Rabaey
Reliable VLSI Design in the Nanometer Regime Huifang Qin
Ruth Wang
Jan M. Rabaey
Algorithms and VLSI Implementations of Low Power Digital Baseband Timing Recovery Systems for Wireless Communications M. Josie Ammer Jan M. Rabaey
Power Management for Low-Power Sensor Nodes Michael Sheets Jan M. Rabaey
A Low Power Low Noise Amplifier for Wireless Sensor Nodes Richard Lu Jan M. Rabaey
Implementation of a Locationing Engine for Low Power Sensor Nodes Tufan Karalar Jan M. Rabaey
Architecture and IC Implementation of Digital PWM Controller Jinwen Xiao
Jianhui Zhang
Angel Peterchev
Seth R. Sanders
Manufacturing Issues in Extreme Ultraviolet Lithography Jason Cain Costas J. Spanos
Electrical Impedance Tomography Based Metrology for Semiconductor Manufacturing Michiel Kruger Costas J. Spanos
Proposed Framework for Lithography Process Control Using Prolith and Full-Profile Metrology Paul Friedberg Costas J. Spanos
Integrated CMP Metrology and Modeling with Respect to Circuit Performance Runzi Chang Costas J. Spanos
Josephson-CMOS Hybrid Memories Operating at 4 K Qingguo Liu Theodore Van Duzer