Contents of Chapter 10: Solid-State Devices

The EECS Research Summary for 2003

[Contents]
Title Author(s) Professor(s)
Industrial FinFET Fabrication Using Standard Processing Tools Leland Chang Jeffrey Bokor
Chenming Hu
Tsu-Jae King
Threshold Voltage Control at Double-Gate Devices Yang-Kyu Choi Jeffrey Bokor
Tsu-Jae King
Sub 30 nm MOSFET Fabrication Peiqi Xuan Jeffrey Bokor
Study of the Effects of Process Variation in Affecting the Performance of Nano MOSFET Devices Shiying Xiong Jeffrey Bokor
Scanning Microscopy Probe for Nanomechanical Resonators Xuchun Liu Jeffrey Bokor
Nanotechnologies for Nanoparticles and Wires Yang-Kyu Choi
Ji Zhu 		Jeffrey Bokor
The Effect of Surface Nano-Textures on Silicon Wafer Bonding Eric Liu Nathan W. Cheung
Integration of GaN Light-Emitting Diodes into Biophotonic Chips by Pixel-to-Point Transfer Using Laser Lift-off and Pd-In Bonding Zhongsheng Luo
Tim Sands 		Nathan W. Cheung
Capacitorless DRAM Technologies for High Density Memory Applications Charles Kuo Chenming Hu
Tsu-Jae King
Molybdenum Gate Work-Function Engineering for Ultra-Thin-Body Silicon-on-Insulator (UTB SOI) MOSFETs Daewon Ha
Pushkar Ranade
Yang-Kyu Choi 		Chenming Hu
Tsu-Jae King
SPICE Model Development for FDSOI MOSFETs above 10 GHz Hui Wan
Pin Su
Peter W. Wyatt
Mansun Chan 		Chenming Hu
Ali Niknejad
A Standard Model for SOI Circuit Design Pin Su
Hui Wan
Mansun Chan 		Chenming Hu
Ali Niknejad
Compact Modeling of Double-Gate MOSFETs Chung-Hsun Lin
Mansun Chan 		Chenming Hu
As-Deposited Poly-SiGe MEMS Structure with Low Stress and Low Strain Gradient Blake C.-Y. Lin Tsu-Jae King
Impact of Gate Process Technology on EOT of HfO2 Gate Dielectric Daewon Ha
Hideki Takeuchi 		Tsu-Jae King
Excimer Laser Annealing for Reducing Gate Depletion Effects in Deep-Submicron CMOS Technologies Hiu Yung Wong Tsu-Jae King
Thin Silicon Nitride Layers for Abrupt Junctions Katherine Buchheit Tsu-Jae King
Selective SiGe CVD Process for Raised-S/D FinFET Application Kyoungsub Shin Tsu-Jae King
Effects of Process-Induced Variations on Asymmetric vs. Symmetric Double-Gate MOSFETs Kyoungsub Shin
Sriram Balasubramanian
Hiu Yung Wong
Leland Chang 		Tsu-Jae King
Contact Resistivity of p+ SiGe Deposited onto TiN Marie-Ange Eyoum Tsu-Jae King
Development of a Focused Ion Beam System for High-throughput Maskless, Direct Lithography Qing Ji Tsu-Jae King
Planar Self-Aligned Double Gate Sub 50 nm MOSFETs Sriram Balasubramanian Tsu-Jae King
Sub-10 nm FETs: Thin Body Back Gated Schottky Transistors Varadarajan Vidya Tsu-Jae King
Single Cell Activity Detection System based on NanoLAPS Qintao Zhang Luke P. Lee --BioE
Enhanced Quantitative Analysis of Resist Image Contrast upon Line Edge Roughness (LER) Mike Williamson Andrew R. Neureuther
Maskless EUV Lithography Using Nanomirror Light Modulator Arrays Yashesh Shroff William G. Oldham
Printable Materials Development Daniel Huang
Steven Volkman
Paul Chang
Haleh Razavi 		Vivek Subramanian
Organic Gas Sensors Frank Liao
Steve Volkman 		Vivek Subramanian
High Performance Organic Devices Paul Chang
Brian Mattis
Tuyen Le 		Vivek Subramanian
Inkjet Printing of Organic Devices Steve Molesa
Dave Redinger
Frank Liao
Josephine Lee 		Vivek Subramanian
Internally Shunted Josephson Junctions for Ultra-High Speed Logic Xianghui Zeng
Xiaofan Meng 		Theodore Van Duzer
Light-Anodization Process for High-Jc Micron and Submicron Superconducting Junction and Integrated Circuit Fabrication Xiaofan Meng
Xianghui Zeng 		Theodore Van Duzer