PARMEX 1.0 AND PIX-PARMEX
PARMEX is a data-analysis and curve-fitting tool for determining parameters in resist dissolution models used in lithography simulators such as SAMPLE and PROLITH. Data are accepted in the form of reflectivity versus time, thickness versus time, and rate versus depth. Signals can be conditioned (spike or smooth), and multiple zones from several wafers can be selected or deleted. The dissolution rate is first related to fundamental exposure state descriptions, such as the normalized fraction of photo-active compound for optical exposure, or the deposited energy per unit volume for electron-beam exposure. An optimizing routine (using the Marquardt algorithm) then fits a user-selected resist model to the data. The current version of PARMEX (version 1.0) supports optical-exposure models for positive resists with measurements taken on matched or reflective substrates and the electron-beam exposure models for both positive and negative resists.
PIX-PARMEX is a graphical user interface that supports PARMEX, allowing all of the options to be accessed from an X Window display and eliminating the need to remember key words or trial statements. Dialog boxes are automatically generated to fetch the appropriate arguments for each PARMEX command, and links to SAMPLE and DRAWPLOT exist.
PARMEX is a nongraphical FORTRAN program with a two-column output file that can be linked to any plot program.
Documentation Included with the Program:
- User's Guide and Installation Notes. Available separately for $5.00
Additional Documentation Available:
- W. R. Bell II, Determination of Process Simulation Parameters from Experiment: Plasma Etching and Photoresist Dissolution (UCB/ERL M87/47, June 1987). $5.00
- S. M. Chiu, PIX (Program User Interface in X) (UCB/ERL M91/64, June 1991). $5.00
Documentation Showing Uses of Program:
- N. N. Tam, Characterization of Electron-Beam-Exposed Negative Resists (UCB/ERL M88/32, May 1989). $5.00
- R. A. Ferguson, Modeling and Simulation of Reaction Kinetics in Advanced Resist Processes for Optical Lithography (UCB/ERL M91/78, September 1991). $25.00
- N. N. Tam, Resist Mechanisms and Models in Electron-Beam Lithography (UCB/ERL M91/102, November 1991). $25.00
Special Licensing/Distribution Restrictions: The data-analysis routines contributed by Philips Research Laboratory of Sunnyvale, CA, which are included on the tape, cannot be redistributed without making a separate redistribution agreement with Philips. Contact Philips directly regarding redistribution.