Additional SAMPLE Documentation

The following documentation may be ordered separately from the SAMPLE programs for the prices indicated.

1. SAMPLE 1.6a User's Guide (general information, commands, program structure, output examples), 267 pages. $15.00
2. SAMPLE 1.7a User's Guide. $15.00
3. SAMPLE 1.7a Installation Notes. $2.50
4. SAMPLE 1.8 Installation Notes. $2.50
5. PC User's Installation Supplement. $2.50
6. S. N. Nandgaonkar, Design of a Simulator Program (SAMPLE) for IC Fabrication (UCB/ERL M79/16, June 1975). $15.00
7. M. M. O'Toole, Simulation of Optically Formed Images in Positive Photoresist (UCB/ERL M79/42, June 1979). $15.00
8. R. Jewett, A String Model Etching Algorithm (UCB/ERL M79/68, October 1979). $5.00
9. J. L. Reynolds, Simulation of Dry Etched Line-Edge Profiles for Electron-Beam Lithography (UCB/ERL M81/2, January 1991). $10.00
10. C. Sung, Simulation and Modeling of Evaporated Deposition Profiles (UCB/ERL M81/8, February 1981). $10.00
11. M. G. Rosenfield, Simulation of Developed Resist Profiles for Electron-Beam Lithography (UCB/ERL M81/40, June 1981). $15.00
12. K. Lee, Topography-Dependent Step Coverage Resistance Simulation (UCB/ERL M83/80, March 1983). $5.00
13. S. N. Nandgaonkar, A Family of Simulation Programs for IC Fabrication Processes (Their Structure, Design, Implementation) (UCB/ERL M84/90, October 1984). $15.00
14. M. D. Prouty, Additions to the Imaging Capability of SAMPLE (UCB/ERL M84/111, December 1984). $10.00
15. L. Wineberg, Modeling Lift-Off Deposition (UCB/ERL M84/112, December 1984). $10.00
16. P. D. Flanner III, Two-Dimensional Optical Imaging for Photolithography Simulation (UCB/ERL M86/57, July 1986). $10.00
17. S. F. Meir, Etching Simulation of Nonplanar Layers in the SAMPLE Program (UCB/ERL M87/41, June 1987). $5.00
18. R. Ferguson, Simulation of Contrast Enhanced Lithography (UCB/ERL 87/42, June 1987). $5.00
19. K. K. H. Toh, Two-Dimensional Imaging with Effects of Lens Aberrations in Optical Lithography (includes SPLAT 2.0 User's Guide) (UCB/ERL M88/30, May 1988). $10.00
20. K. K. H. Toh, Algorithms for Three-Dimensional Simulation of Photoresist Development (UCB/ERL M90/123, December 1990). $32.00
21. R. A. Ferguson, Modeling and Simulation of Reaction Kinetics in Advanced Resist Processes for Optical Lithography (UCB/ERL M91/78, September 1991). $20.00
22. E. W. Scheckler, Algorithms for Three-Dimensional Simulation of Etching and Deposition Processes in Integrated Circuit Fabrication (UCB/ERL M91/99, November 1991). $35.00
23. N. N. Tam, Resist Mechanisms and Models in Electron-Beam Lithography (UCB/ERL M91/102, November 1991). $20.00