Nathan W. Cheung
- Nanofabrication; Heterogeneous integration of microsystems; Plasma and ion-beam processing technologies; Electronic materials
- Feature-Level Compensation and Control (FLCC)
- Integrated Modeling Process and Computation for Technology (IMPACT)
He received his Ph.D. in applied physics from the California Institute of Technology, 1980. Prior to joining the faculty of EECS, he held research positions at the Exxon Research Laboratory at Linden, JNJ and Bell Telephone Laboratories at Murray Hill NJ. Dr. Cheung is a member of IEEE, the American Electro-chemical Society, the American Vacuum Society, the Materials Research Society, and the Böhmische Physikalische Gesellschaft.